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About UsJiangxi Nayu Nano New Materials Co., Ltd. was established in January 2012. It is a high-tech enterprise with industry experts and venture capital companies as the start-up team.
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ProductJiangxi Nayu Nano New Materials Co., Ltd. was established in January 2012. It is a high-tech enterprise with industry experts and venture capital companies as the start-up team.
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SolutionJiangxi Nayu Nano New Materials Co., Ltd. was established in January 2012. It is a high-tech enterprise with industry experts and venture capital companies as the start-up team.
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NewsJiangxi Nayu Nano New Materials Co., Ltd. was established in January 2012. It is a high-tech enterprise with industry experts and venture capital companies as the start-up team.
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Human ResourcesWe strive to help young talents grow rapidly, create various opportunities for talented and capable talents to stand out, provide a broader platform for talents with outstanding contributions, and provide all types of talents
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Contact usThank you for visiting the official website of Nayu Nano. If you have any cooperation intentions or suggestions, you can contact us through the following methods and we will reply as soon as possible. Thank you!
Products
Products
NYS1-6S-Nano silicon oxide polishing fluid
This product is a nano-silica independently developed and produced by our company with small particle size, uniform particle size, narrow particle size distribution, large specific surface area, and stable chemical properties. It is compounded with surfactants, stabilizers, oxidants, etc., and adopts nanotechnology. Chemical mechanical polishing fluid synthesized with ultra-dispersed equipment. Nano-silica solid particles provide grinding effect, and chemical oxidants provide corrosion and dissolution. SiO2 particles have uniform particle size, narrow particle size distribution, stable chemical properties, moderate softness and hardness, strong impact resistance, high removal rate, and good surface quality. , can produce product surfaces with high geometric dimensional accuracy and sub-nanometer surface roughness.
Classification:
Special for grinding and polishing
Details
product description
This product is a nano-silica independently developed and produced by our company with small particle size, uniform particle size, narrow particle size distribution, large specific surface area, and stable chemical properties. It is compounded with surfactants, stabilizers, oxidants, etc., and adopts nanotechnology. Chemical mechanical polishing fluid synthesized with ultra-dispersed equipment. Nano-silica solid particles provide grinding effect, and chemical oxidants provide corrosion and dissolution. SiO2 particles have uniform particle size, narrow particle size distribution, stable chemical properties, moderate softness and hardness, strong impact resistance, high removal rate, and good surface quality. , can produce product surfaces with high geometric dimensional accuracy and sub-nanometer surface roughness.
Features
1. The product is a white emulsion of nano-Si02 alkaline aqueous solution;
2. Nano-polishing liquid has stable polishing quality, controllable particle size, concentrated particle size distribution, moderate softness and hardness, and will not scratch the paraboloid surface.
3. Good suspension, not easy to settle, easy to use.
4. Good dispersion and uniform emulsion, which improves polishing efficiency and precision.
5. Features include low surface tension, easy cleaning, high polishing rate, and low polished mirror roughness;
6. It has polishing and passivation functions, and the polished surface has a high mirror effect.
Performance
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project |
index |
|
model |
NYS1-6S |
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Exterior |
white liquid |
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content% |
10±0.5 |
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Particle size nm |
30~60 |
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Specific surface area m2/g |
640±50 |
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pH value |
9.5～11 |
Application areas
The products are mainly used in aluminum alloy mirror polishing, stainless steel mirror polishing, marble and stone fine polishing technology, stainless steel, titanium alloy, aluminum alloy mirror polishing, optical lenses, single-core optical fiber connectors, glass-ceramic substrates, crystal surfaces, gemstones, glass Precision polishing of products, metal products, semiconductor materials, plastics, tapes, polishing tapes, etc. As an auxiliary material in the semiconductor process, it is mainly used in the polishing process of polishing wafers and discrete device manufacturing processes. Different ratios can be optimized according to needs during polishing, all of which can meet better usage requirements.
Instructions for use
It is recommended to add 0.6%~10%; 25kg/barrel
Nano silicon oxide series nano titanium oxide series nano zinc oxide aluminum oxide series
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Thank you for visiting the official website of Nanyu Nanomaterials. If you have any cooperation intentions or suggestions, please contact us through the following methods, and we will reply as soon as possible, thank you!
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Office: 0793-3855337
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